This project aims to develop a compact, desktop-scale maskless photolithography system for rapid microfabrication without the need for physical photomasks. By combining programmable optical pattern generation with precision projection optics and software-controlled exposure, the system will enable direct writing of user-defined micro-scale patterns onto standard photoresists. Compared to conventional mask-based lithography, the proposed platform will significantly reduce cost and turnaround time, allowing fast design iteration and flexible device prototyping. The system is designed to achieve micron-level resolution while remaining compatible with common substrates and photoresists, making it an enabling tool for research in microelectronics, photonics, and quantum materials, as well as for training and exploratory fabrication in laboratories with limited cleanroom access.