Nano/microfabrication technologies for microelectronic
Project Description
Nano/microfabrication technology is the engine behind microelectronics and photonics. Advances in microfabrication can enable novel structures to break limiting factors in conventional systems, leading to higher performance. This project aims to investigate different nano/microfabrication technologies (including Ebeam lithography, plasma dry etching, material deposition, etc.) for different materials and structures. Based on nano/microfabrication technology, novel micro-devices will be fabricated for signal processing.
Supervisor
YANG, Yansong
Quota
4
Course type
UROP1000
UROP1100
UROP2100
UROP3100
UROP4100
Applicant's Roles
Students need to receive training in Nanosystem Fabrication Facility (NFF) and learn how to use the equipment for nano/microfabrication. They also need to participate in meetings and discussions with the supervisor.
Applicant's Learning Objectives
Students will receive laboratory training in the cleanroom for microfabrication techniques: material depositions, oxidation, wafer bonding, optical lithography, wet and dry etching, lift-off, and structure release. After learning how to use the corresponding machines, they will learn how to plan a microfabrication process to fabricate their own designs.
Complexity of the project
Moderate